High-Sensitivity Metal-Dielectric Surface Plasmon Micro-Sensors
PI:
Dr. Wan Kuang,
Electrical and Computer Engineering, Boise State University
Many applications exist for sensors capable of providing
real-time analysis, for instance, detection of toxic industrial
pollutants and monitoring for substances of national security
interests. Processing of samples through chemical labs results
in significant time delays.
In
this program, we will make use of metal-dielectric surface
plasmon resonant cavity to accomplish simultaneous and
instantaneous analysis. Surface plasmon is a group of excited
electrons (Ritchie, 1957), behaving like a single electrical
entity at the metal-dielectric interface as a result of the
resonant interaction between the surface charge oscillation and
the electromagnetic field. The appeal of surface plasmon
excitation for sensors arises from the large electromagnetic
field enhancement at the metal surface, which leads to increased
light-matter interactions. Any slight change in the chemical
composition of the environment within the range of the plasmon
field causes a change in the wavelength of light that resonates
with the plasmon.
The
application of surface plasmon in biological and chemical
sensors is not new; Liedberg et. al. (1995) has demonstrated
high sensitivity and accuracy surface plasmon sensor. However
due to the use of a prism as an input coupler, they are bulky
and fragile and are intended for laboratory use only. Since each
sensor can detect only a single substance, it is extremely
time-consuming and thus impractical to be deployed for airport
security or other situations where simultaneous analysis of
multiple substances is required. To overcome this limitation, we
will replace the prism coupler with a properly engineered
diffractive optical element. The optical element serves to
reduce the device footprint as well as to enhance its
sensitivity. As a result, miniaturized sensor cells, each of
which is responsible for the detection of a unique material, can
be integrated onto a single sensor chip.
Fig. 2 shows a schematic for the proposed surface plasmon
micro-sensor. A thin metal film is deposited on a silica or
silicon substrate. A nanometer-scale periodic structure is
patterned on the metal film with e-beam lithography and dry
etching to serve as an equivalent prism. Fig. 3 shows a scanning
electron micrograph of device surface. Continuous efforts are
made to improve fabrication process and reduce the surface
roughness. The sensor is illuminated from the bottom (silica)
side at a normal angle. The reflection off the patterned metal
film is fed to an infrared detector. At a certain wavelength
when the phase matching condition is satisfied for surface
plasmon polaritons at the metal-air interface, optical power is
absorbed by the electrons, which leads to a decrease of
intensity for the reflected light. The presence of an absorbed
sample alters the width, position, and the height of the peaks
in both reflection and transmission spectrum.
Bo Liedberg, Claes Nylander, and Ingemar Lundstrom, Biosensing
with surface plasmon resonance-how it all started, Biosensors
and Bioelectronics, 10:1–9, 1995.
R. H. Ritchie. Plasma losses by fast electrons in thin films,
Physical Review, 106(5):874–881, 1957.
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